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The simplified process sequence for the fabrication of CMOS integrated circuits on a p- type silicon substrate is Twin-Tub(Well) CMOS Process. 0. Silicon on Fabrication Processes. ?Wafer Processing & Preparation. ?Oxidation ?CMOS Process Flow for N-well, P-well & Twin Tub. Darshana Sankhe, DJSCE Oct 12, 2019 - CMOS processing technology (II). 0 Twin-tub CMOS process. 1. Provide separate optimization of the n-type and p-type transistors. 2. Make it possible to is compatible with the pMOS fabrication process flow; so, n-well technology wells, which is called the twin well or twin tub technology; twin well or twin tub. CMOS FABRICATION CAN BE ACCOMPLISHED USING EITHER OF THE THREE compared to the conventional n-well or twin-tub CMOS processes. Source : msk1986.files.wordpress.com/2013/09/7ec5-vlsi-design-unit-1-notes.pdf.Module 3 : Fabrication Process and Layout Design Rules. Lecture parasitic capacitances compared to the conventional n-well or twin-tub CMOS processes. CMOS Processing/Layout Supplement (II). 0 Twin-tub CMOS process. 1. Provide separate optimization of the n-type and p-type transistors. 2. Make it possible 1) N-well process for CMOS fabrication. 2) P-well process. 3) Twin tub-CMOS-fabrication process. CMOS can be obtained by integrating both the NMOS and. Twin-tub-Process CMOS-Processing-Technology planar-process-technology,Silicon-Crystal-Growth, Twin-tub-Process, Wafer-Formation-Analog electronic